发明名称 METHOD FOR MEASURING FILM THICKNESS OF ELECTROPHOTOGRAPHIC PHOTORECEPTOR
摘要 PROBLEM TO BE SOLVED: To make it possible to more exactly measure the film thicknesses of even a photoreceptor formed by roughening a substrate surface. SOLUTION: In this method for measuring the film thicknesses, the measuring wavelength at the time of measurement of the film thicknesses is made longer than the ten point average roughness Rz of the surface roughness of the substrate when the film thicknesses of the electrophotographic photoreceptor coated and formed with a charge generating layer and charge transfer layer on the conductive substrate are measured by using a light interference method. The measuring reflected light is received by just one optical fiber. The optical fiber which receives the light is formed by machining the surface of the film thickness measuring method conductive substrate inclined from the perpendicular position of the conductive substrate.
申请公布号 JP2000356859(A) 申请公布日期 2000.12.26
申请号 JP19990168371 申请日期 1999.06.15
申请人 SHARP CORP 发明人 TAKEZAWA YOICHI;KUROKAWA MAKOTO;SAKAMOTO MASAYUKI;ISHIBASHI HIROKO;MATSUO RIKIYA;KADOI MIKIO
分类号 G03G5/00;G03G5/10;(IPC1-7):G03G5/00 主分类号 G03G5/00
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