| 摘要 |
PROBLEM TO BE SOLVED: To obtain a device monitoring a treatment process for a semiconductor wafer installed in plasma treatment equipment at a real time. SOLUTION: Real-time monitoring equipment for a plasma process has a plurality of measurement units 10 stuck on the semiconductor wader 3, a receiver 7 receiving signals transmitted from the measurement units 10, and a data processor 6 detecting the state of the semiconductor wafer 3 on the basis of the received signals. The measurement unit 10 contains at least one plasma-process sensor and a light-emitting element converting an output from the plasma-process sensor into an optical output, and a power supply supplying the light-emitting element with driving power. COPYRIGHT: (C)2005,JPO&NCIPI
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