| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide the method of polishing GaN substrate that can suppress generation of grinding scratches. <P>SOLUTION: The polishing method of the GaN substrate is a method of polishing the GaN substrate by using a platen and a polishing liquid, while supplying the polishing liquid containing a polishing material and a lubricant. The polishing method includes a charging step of embedding the polishing material into the platen, and a polishing step of polishing the GaN substrate by using the polishing material embedded platen. <P>COPYRIGHT: (C)2009,JPO&INPIT |
