发明名称 SEMICONDUCTOR DEVICE AND FABRICATING METHOD
摘要 A semiconductor device and a relatively simple fabrication process which may maximize fabrication yield. A semiconductor device may include at least one of the following: A first substrate including a capacitor cell. A second substrate including a circuit unit having a transistor and a wire. A connection electrode which electrically connects the capacitor cell and the circuit unit.
申请公布号 US2008048290(A1) 申请公布日期 2008.02.28
申请号 US20070841082 申请日期 2007.08.20
申请人 HAN JAE-WON 发明人 HAN JAE-WON
分类号 H01L29/00;H01L21/02 主分类号 H01L29/00
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