发明名称 LASER PLASMA X-RAY SOURCE APPARATUS BASED ON TARGET LOCATION RECOGNITION AND FAST, ACCURATE TARGET MANIPULATION STAGE
摘要 The present invention relates to an X-ray generating apparatus using a laser plasma, and more specifically to an X-ray generating apparatus using a laser plasma capable of precisely confirming the location of the target by using an imaging device and moreover stably producing an X-ray with high strength by transferring the location of the target at high speed and adjusting the location of the target with a high precision. The present invention comprises: a target which produces plasma when laser is applied and generates the X-ray; a laser reflecting unit which reflects the laser so that laser moves in the target direction; a laser focusing lens which collects the laser and applies the laser to the target; a target location measurement unit which photographs the image of the target and measures the location; and a target transfer unit which transfers the target in consideration of the location of the measured target by the target location measuring unit, wherein the target location measurement unit is located in a direction to face the target based on a laser reflector.
申请公布号 KR20160063519(A) 申请公布日期 2016.06.07
申请号 KR20140166688 申请日期 2014.11.26
申请人 KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE 发明人 KIM, JAE HOON;YANG, KEE DONG;HEO, DU CHANG;KIM, JONG UK
分类号 H05G2/00;H01S4/00 主分类号 H05G2/00
代理机构 代理人
主权项
地址