发明名称 Vapor deposition apparatus and process for continuous indirect deposition of a thin film layer on a substrate
摘要 An apparatus and related process are provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate. A deposition head is configured for sublimating a source material supplied thereto. The sublimated source material condenses onto a transport conveyor disposed below the deposition head. A substrate conveyor is disposed below the transport conveyor and conveys substrates in a conveyance path through the apparatus such that an upper surface of the substrates is opposite from and spaced below a lower leg of the transport conveyor. A heat source is configured adjacent the lower leg of the transport conveyor. The source material plated onto the transport conveyor is sublimated along the lower leg and condenses onto to the upper surface of substrates conveyed by the substrate conveyor.
申请公布号 US9412892(B2) 申请公布日期 2016.08.09
申请号 US201313751761 申请日期 2013.01.28
申请人 First Solar, Inc. 发明人 Black Stacy Ann
分类号 H01L31/18;C23C14/24;C23C14/56;H01L21/677 主分类号 H01L31/18
代理机构 MacMillan, Sobanski & Todd, LLC 代理人 MacMillan, Sobanski & Todd, LLC
主权项 1. A process for indirect vapor deposition of a thin film of sublimated source material onto a photovoltaic (PV) module substrate, the process comprising: sublimating source material in a deposition head; plating the sublimated source material onto a transfer device comprising a plurality of interconnected slats forming an endless loop transfer conveyor having an upper leg and a lower leg, said plating being performed at an upper leg; moving the transfer device to a position adjacent to a substrate conveyor; and, sublimating the source material from the transfer device such that the sublimated source material transfers onto a surface of a substrate carried by the substrate conveyor.
地址 Tempe AZ US