发明名称 | Semiconductor device | ||
摘要 | A semiconductor device includes a semiconductor substrate of a first conductivity type, an impurity layer of a second conductivity type provided within the semiconductor substrate, an impurity region of the second conductivity type that is connected, within the semiconductor substrate, to the impurity layer, and separates a first region of the semiconductor substrate from a second region by surrounding the first region of the semiconductor substrate together with the impurity layer, a first well and second well of the second conductivity type that are provided on the impurity layer via at least a semiconductor layer of the first conductivity type, and a plurality of transistors provided to the semiconductor substrate. | ||
申请公布号 | US9412738(B2) | 申请公布日期 | 2016.08.09 |
申请号 | US201514677396 | 申请日期 | 2015.04.02 |
申请人 | SEIKO EPSON CORPORATION | 发明人 | Furuhata Tomoyuki |
分类号 | H01L29/66;H01L27/088;H01L29/78;H01L29/36;H01L29/06;H01L21/8238;H01L27/092;H01L21/8234 | 主分类号 | H01L29/66 |
代理机构 | Oliff PLC | 代理人 | Oliff PLC |
主权项 | 1. A semiconductor device comprising: a semiconductor substrate of a first conductivity type; an impurity layer of a second conductivity type disposed within the semiconductor substrate; an impurity region of the second conductivity type that is connected to the impurity layer within the semiconductor substrate, the impurity region and the impurity layer separating a first region of the semiconductor substrate from a second region of the semiconductor substrate by surrounding the first region of the semiconductor substrate; a first well and a second well of the second conductivity type disposed in the first region of the semiconductor substrate and separated from the impurity layer by at least a semiconductor layer of the first conductivity type; and a plurality of transistors disposed in the semiconductor substrate. | ||
地址 | Tokyo JP |