| 发明名称 |
COMPOUND, RESIN AND PHOTORESIST COMPOSITION |
| 摘要 |
A compound represented by formula (I):;;wherein R1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom,
L1 represents a C1-C8 fluorinated alkanediyl group,
X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L1, and
R2 represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom. |
| 申请公布号 |
US2016244400(A1) |
申请公布日期 |
2016.08.25 |
| 申请号 |
US201615047894 |
申请日期 |
2016.02.19 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
MASUYAMA Tatsuro;YAMAGUCHI Satoshi;ICHIKAWA Koji |
| 分类号 |
C07C69/653;C08F122/18;C08F222/18;G03F7/038;C07C69/753;G03F7/20;G03F7/38;G03F7/32;C07C69/757;C08F220/68;G03F7/16 |
主分类号 |
C07C69/653 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A compound represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom, L1 represents a C1-C8 fluorinated alkanediyl group, X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L1, and R2 represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom. |
| 地址 |
Tokyo JP |
