发明名称 METHOD AND DEVICE FOR CUTTING WAFER
摘要 PROBLEM TO BE SOLVED: To provide a method and device for cutting a wafer, capable of effectively obtaining chips with stable quality.SOLUTION: A method for cutting a wafer includes: a grinding step of grinding the rear face of the wafer with a grindstone while the surface of the wafer is vacuum-sucked with a wafer chuck; a polishing step of, after the grinding step, polishing the rear face of the wafer using a polishing cloth; and a cutting step of, after the polishing step, cutting the wafer.SELECTED DRAWING: Figure 9
申请公布号 JP2016167618(A) 申请公布日期 2016.09.15
申请号 JP20160087866 申请日期 2016.04.26
申请人 TOKYO SEIMITSU CO LTD 发明人 OSHIDA SHUHEI;SHIMIZU TASUKU;FUJITA TAKASHI;UEKIHARA AKIRA
分类号 H01L21/301;B23K26/53;B24B7/22;B24B37/10;H01L21/304 主分类号 H01L21/301
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