发明名称 Circuit substrate and method of manufacturing same
摘要 A circuit interconnecting substrate manufacturing method includes depositing a first layer of metallic powder on top of a carrier, and then forming a first layer of electrically conductive traces from the first layer of metallic powder. A second layer of metallic powder is then deposited onto at least one region of the first layer of electrically conductive traces. Then a second layer of electrically conductive traces is formed from the second layer of metallic powder and each trace of the second layer is electrically coupled to a trace of the first layer. An insulating material is deposited onto the carrier to provide an insulating substrate that supports the traces. The method does not require the use of any wet chemicals or chemical etching steps.
申请公布号 US9474162(B2) 申请公布日期 2016.10.18
申请号 US201414151828 申请日期 2014.01.10
申请人 FREESCALE SEMIOCNDUCTOR, INC. 发明人 Foong Chee Seng;Tan Lan Chu
分类号 H01L21/00;H05K3/00;H05K1/09 主分类号 H01L21/00
代理机构 代理人 Bergere Charles E.
主权项 1. A method of manufacturing a circuit interconnecting substrate, the method comprising: depositing a first layer of metallic powder on top of at least one region of a carrier; forming a first layer of electrically conductive traces from the first layer of metallic powder; depositing a second layer of metallic powder onto at least one region of the first layer of electrically conductive traces; forming a second layer of electrically conductive traces from the second layer of metallic powder, each trace of the second layer of electrically conductive traces being electrically coupled to at least one trace of the first layer of electrically conductive traces; depositing an insulating material onto the carrier, wherein the insulating material forms an insulating substrate that supports the traces; and depositing a third layer of metallic powder onto at least one region of the second layer of electrically conductive traces; and forming a third layer of electrically conductive traces from the third layer of metallic powder, each third layer of electrically conductive traces being electrically coupled to at least one of the second layer of electrically conductive traces, wherein after forming the third layer of electrically conductive traces, removing regions of the metallic powder that do not form the electrically conductive traces.
地址 Austin TX US