| 摘要 |
The method for production of two or three-dimensional structures from solid substrate by controlled mass transfer of joined materials by electron beam, when solid substrate is prepared, area for electron beam exposure is defined, electron beam dimensions are defined, acceleration voltage and electron beam is defined, substrate is exposed by at least one electron beam, while exposure time is related to required volume growth of two and three dimensional objects, and electron beam is moving inside repeating scanning pattern of exposed area. |
