发明名称 |
Non-alkali glass substrate |
摘要 |
The present invention relates to a non-alkali glass substrate, having a strain point of 685° C. or higher and 750° C. or lower, an average thermal expansion coefficient at 50 to 350° C. of from 35×10−7 to 43×10−7/° C., a specific gravity of from 2.50 to 2.80, a photoelastic constant of 25 nm/MPa/cm or more and less than 29 nm/MPa/cm, and a temperature (T4) at which viscosity reaches 104 dPa·s of 1,250° C. or higher and lower than 1,350° C., and having a prescribed composition. |
申请公布号 |
US9505650(B2) |
申请公布日期 |
2016.11.29 |
申请号 |
US201314648779 |
申请日期 |
2013.12.02 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
Nishizawa Manabu;Koike Akio;Tokunaga Hirofumi |
分类号 |
C03C3/091 |
主分类号 |
C03C3/091 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A non-alkali glass substrate, having a strain point of 685° C. or higher and 750° C. or lower, an average thermal expansion coefficient at 50 to 350° C. of from 35×10−7 to 43×10−7/° C., a specific gravity of from 2.50 to 2.80, a photoelastic constant of 25 nm/MPa/cm or more and less than 29 nm/MPa/cm, and a temperature (T4) at which viscosity reaches 104 dPa·s of 1,250° C. or higher and lower than 1,350° C., and comprising, indicated by mol % on the basis of oxides,
63% or more and 68% or less of SiO2, 12.2% or more and 14% or less of Al2O3, 0.5% or more and less than 3% of B2O3, 6.5% or more and 13% or less of MgO, 0% or more and less than 4% of CaO, 0% or more and 9% or less of SrO, and 0% or more and 10% or less of BaO, wherein
MgO+CaO+SrO+BaO is from 15 to 20%, andSrO+BaO is from 4 to 10%. |
地址 |
Chiyoda-ku JP |