发明名称 |
ELECTRON MICROSCOPE AND MEASURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide an electron microscope capable of measuring an amount of deflection at the time when an electron beam transmits through a sample, with high sensitivity and high positional resolution.SOLUTION: An electron microscope 100 for measuring an amount of deflection at the time when an electron beam EB transmits through a sample S includes: an electron beam source generating an electron beam EB; an illumination-lens system focusing the electron beam EB to irradiate the sample S; an iris 30 having an electron beam shielding section that shields between a central part EB1 and an outer peripheral part EB2 of an electron beam EB that is incident to the sample S; and a divided detector 20 in which a detection surface 22 for detecting an electron beam EB transmitting through the sample S is divided into a plurality of detection areas.SELECTED DRAWING: Figure 5 |
申请公布号 |
JP2016219118(A) |
申请公布日期 |
2016.12.22 |
申请号 |
JP20150099377 |
申请日期 |
2015.05.14 |
申请人 |
UNIV OF TOKYO;JEOL LTD |
发明人 |
SHIBATA NAOYA;KONO YUJI;SAWADA HIDEAKI |
分类号 |
H01J37/295;H01J37/09;H01J37/10;H01J37/244 |
主分类号 |
H01J37/295 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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