发明名称 ELECTRON MICROSCOPE AND MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electron microscope capable of measuring an amount of deflection at the time when an electron beam transmits through a sample, with high sensitivity and high positional resolution.SOLUTION: An electron microscope 100 for measuring an amount of deflection at the time when an electron beam EB transmits through a sample S includes: an electron beam source generating an electron beam EB; an illumination-lens system focusing the electron beam EB to irradiate the sample S; an iris 30 having an electron beam shielding section that shields between a central part EB1 and an outer peripheral part EB2 of an electron beam EB that is incident to the sample S; and a divided detector 20 in which a detection surface 22 for detecting an electron beam EB transmitting through the sample S is divided into a plurality of detection areas.SELECTED DRAWING: Figure 5
申请公布号 JP2016219118(A) 申请公布日期 2016.12.22
申请号 JP20150099377 申请日期 2015.05.14
申请人 UNIV OF TOKYO;JEOL LTD 发明人 SHIBATA NAOYA;KONO YUJI;SAWADA HIDEAKI
分类号 H01J37/295;H01J37/09;H01J37/10;H01J37/244 主分类号 H01J37/295
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