发明名称 |
IMPRINT DEVICE AND GOODS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide an imprint device which inhibits occurrence of pattern defects and is advantageous in terms of pattern formation accuracy.SOLUTION: An imprint device places an imprint material applied to a substrate in contact with a mold to form patterns on the substrate and includes: an application part which applies an imprint material to the substrate; and a supply part 111 which supplies the imprint material to the application part. The supply part 111 includes: a storage tank 1 which stores the imprint material; a pump 2 which continuously circulates the imprint material between the storage tank 1 and the application part; and a filter 5 disposed in a passage in which the imprint material circulates and configured to remove foreign objects and metal ions.SELECTED DRAWING: Figure 4 |
申请公布号 |
JP2016219783(A) |
申请公布日期 |
2016.12.22 |
申请号 |
JP20160061223 |
申请日期 |
2016.03.25 |
申请人 |
CANON INC |
发明人 |
VAN NGUYEN TRUSKETT;MATTHEW S SHAFRAN;SAUL LEE;MIYAJIMA YOSHIKAZU |
分类号 |
H01L21/027;B29C59/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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