发明名称 IMPRINT DEVICE AND GOODS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an imprint device which inhibits occurrence of pattern defects and is advantageous in terms of pattern formation accuracy.SOLUTION: An imprint device places an imprint material applied to a substrate in contact with a mold to form patterns on the substrate and includes: an application part which applies an imprint material to the substrate; and a supply part 111 which supplies the imprint material to the application part. The supply part 111 includes: a storage tank 1 which stores the imprint material; a pump 2 which continuously circulates the imprint material between the storage tank 1 and the application part; and a filter 5 disposed in a passage in which the imprint material circulates and configured to remove foreign objects and metal ions.SELECTED DRAWING: Figure 4
申请公布号 JP2016219783(A) 申请公布日期 2016.12.22
申请号 JP20160061223 申请日期 2016.03.25
申请人 CANON INC 发明人 VAN NGUYEN TRUSKETT;MATTHEW S SHAFRAN;SAUL LEE;MIYAJIMA YOSHIKAZU
分类号 H01L21/027;B29C59/02 主分类号 H01L21/027
代理机构 代理人
主权项
地址