发明名称 POSITIVE RADIATION SENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain the positive radiation sensitive composition high in sensitivity and contrast by incorporating a specified phenol resin. SOLUTION: This positive radiation sensitive composition is composed essentially of a novolak resin obtained by condensing a substituted phenol with an aldehyde compound, and a quinonediazido compound obtained by reaction of a polyphenol compound with a 1,2-naphthoquinonediazido-4-(or -5) sulfonylchloride, and a phenolnovolak resin comprising a unit having 2 nuclei in an amount of 1-10 weight%, and a unit having 3 nuclei in an amount of >=20 weight% unit, and a unit having 4 nuclei in an amount of 5-20 weight%. It is preferred that the weight ratio of the 3-nuclei compd. to the 4-nuclei compd. is 2-15 and the substituted phenol is cresol, and the polyphenol compound is alkylpyrogallol.
申请公布号 JPH10326012(A) 申请公布日期 1998.12.08
申请号 JP19980077406 申请日期 1998.03.25
申请人 TORAY IND INC 发明人 TAMURA KAZUTAKA;NIO HIROYUKI;KANATSUKI SHIGEYOSHI
分类号 G03F7/022;G03F7/023;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/022
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