| 摘要 |
<p>This invention relates to antimicrobial fabrics which are treated with a specific durable and regenerable halamine/chlorine system and methods of removing residual active chlorine from the target textile surface without reducing the antimicrobial activity of the textile. Such methods comprise contacting an amine-treated fabric first with a halogen-based bleach (or other halogenated liquid) to produce halamines at the fabric surface, and subsequently washing the resultant halogenated fabric with a reducing agent which removes the residual, unbonded halogen (such as chlorine) from the fabric surface but does not, surprisingly, remove the halamine halogen. The remaining halamine halogen thus provides the desired antimicrobial activity. As a result, a method of substantially reducing fabric discoloration, odor, and potential skin irritation due to the presence of amounts of residual unbonded halogen (such as chlorine) on the target fabric surface is provided which simultaneously permits sufficient amounts of halamine halogen (such as chloramine chlorine) to remain on the target fabric for optimum microbiocidal propoerties. A fabric treated in accordance with this method is also provided.</p> |
