METHOD OF FORMING SUBSTRATE FOR USE IN CALIBRATING METROLOGY TOOL, CALIBRATION SUBSTRATE, AND METROLOGY TOOL CALIBRATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a technology capable of further easily compensating for an orientation-dependent offset within a metrology tool.

SOLUTION: This method is constituted for forming a substrate for use in calibrating the metrology tool in order to compensate for orientation-dependent variations within the metrology tool. In a substrate forming method, a layer of a radiation sensitive material is arranged on a substrate surface, and is exposed by a patterning device (a lithography device) having a calibration pattern including a first set of pattern features and a second set of pattern features.

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