TOOL FOR FILM DEPOSITION TREATMENT, PLASMA CVD SYSTEM, METAL PLATE, AND OSMIUM FILM DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a tool for film deposition treatment by which a thin film is deposited on a plate having a through-hole extremely small in diameter by one-time plasma deposition processing.

SOLUTION: The tool 8 for film deposition treatment includes: a holding member 39 for holding an aperture plate 107 having a through-hole in the state of exposing the front surface and rear surface of the aperture plate through the through-hole; and an electrode member attached with the holding member. The electrode member is electrically connected to the electrode applied with the plasma electric power of the plasma CVD system.

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