发明名称 FIELD EFFECT TRANSISTOR
摘要 This field effect transistor is provided with: a nitride semiconductor layer that includes a heterojunction; a source electrode (5) and drain electrode (6) that are disposed, with a space therebetween, on the nitride semiconductor layer; a first gate electrode (7) that is positioned between the source electrode (5) and the drain electrode (6) and operates in a normally on state; and a second gate electrode (9) that is positioned between the first gate electrode (7) and the source electrode (5) and operates in a normally off state. The first gate electrode (7) is disposed so as to surround the drain electrode (6) when seen in plan view, and the second gate electrode (9) is disposed so as to surround the source electrode (5) when seen in plan view.
申请公布号 WO2016098391(A1) 申请公布日期 2016.06.23
申请号 WO2015JP73731 申请日期 2015.08.24
申请人 SHARP KABUSHIKI KAISHA 发明人 NAGAHISA, TETSUZO;FUKUMI, MASAYUKI;HANDA, SHINICHI
分类号 H01L21/338;H01L21/336;H01L21/337;H01L27/095;H01L29/06;H01L29/417;H01L29/778;H01L29/78;H01L29/808;H01L29/812 主分类号 H01L21/338
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