GAS INJECTION APPARATUS AND APPARATUS FOR DEPOSITING THIN FILM HAVING THE SAME

摘要

A gas injection device and a thin film depositing device including the same are provided to supply different deposition gas to each injector by separately arranging a plurality of injectors without interference. A thin film deposition device includes a chamber(100), a gas injection device, and a substrate support unit(300). The substrate support unit is prepared to face the gas injection device. The gas injection device is prepared in the upper part of the chamber and includes a plurality of injectors(210), a rotation axis, and a deposition source supplying unit. The plurality of injectors are separately arranged. The rotation axis supports the plurality of injectors and rotates the plurality of injectors horizontally. The deposition source supplying unit is connected to the rotation axis and supplies the reactive gas and the raw material to the injector.