发明名称 |
ELECTROLESS Ni PLATING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide an electroless Ni plating method, capable of directly performing electroless Ni plating on a noble metal film.SOLUTION: An electroless Ni plating method comprises: a base metal film formation step of forming a base metal film 2 having an ionization tendency higher than Pd on a substrate 1; a noble metal film formation step of forming a noble metal film 3 having an ionization tendency lower than that of Pd on the base metal film; an Ni plating step of electroless-plating an Ni film 5 on the noble metal film; a step of heat-treating the noble metal film to precipitate a base metal 2a of the base metal film on the surface of the noble metal film before the Ni plating step; and a Pd film formation step of forming a Pd film 4 on the precipitated base metal by contacting the precipitated base metal with a dip liquid including Pd.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016156034(A) |
申请公布日期 |
2016.09.01 |
申请号 |
JP20150032918 |
申请日期 |
2015.02.23 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
INABA HITOSHI;OKUMURA YOJI;FUJITA TOSHIAKI;NAGATOMO KENSHO |
分类号 |
C23C28/02;C23C18/18;C23C18/36;H05K3/18 |
主分类号 |
C23C28/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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