发明名称 Fabricating method of semiconductor laser
摘要 A method of fabricating a semiconductor laser includes forming an active layer including a compound semiconductor material on a semiconductor substrate, the compound semiconductor material having an energy band gap that monotonically increases as the growth temperature of the material rises above a certain growth temperature, including growing a window structure forming region including at least a region which serves as a waveguide in the proximity of a laser resonator facet at a higher temperature than a region outside the window structure forming region. Therefore, the band gap energy of the window structure forming region is larger than that of the region outside the window structure forming region. Therefore, a semiconductor laser having a window structure can easily be fabricated with a high yield and with great repeatability.
申请公布号 GB2295273(B) 申请公布日期 1998.12.09
申请号 GB19950021891 申请日期 1995.10.25
申请人 * MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MANABU * KATO;TAKASHI * MOTODA
分类号 H01L33/06;H01L33/30;H01S5/00;H01S5/02;H01S5/16;H01S5/323;(IPC1-7):H01S3/19 主分类号 H01L33/06
代理机构 代理人
主权项
地址