| 摘要 |
The invention relates to a method for examining object properties of an object (23, 25) in a substrate (18), using an arrangement (10) that comprises a detector device (11), a localisation device (12) and a control device (13), in which: - in a first step, a first object having first object properties to be examined and first target coordinates is selected, - in a second step an actual position of the detector device (11) is determined using the localisation device (12), - in a third step an actual detection field is determined from the actual position of the detector device (11), by means of the control device (13) and - in a fourth step, the first target coordinates are compared with the actual detection field of the detector device (11), by said control device (13). |
