发明名称 CLEANING SOLUTION AND MANUFACTURING METHOD THEREFOR
摘要 The present invention has an object to provide a highly stable cleaning solution that generates a high concentration of hypochlorous acid during cleaning, and has sterilizing and washing out activity on bacteria and viruses. As means for achieving this object, a cleaning solution has been developed which is an aqueous solution containing hypochlorous acid and hypochlorite ions produced using a diaphragm-free electrolysis process. The effective residual chlorine concentration thereof and the hydrogen ion concentration exponent thereof are adjusted to a value from 500 ppm to 2000 ppm and to a value from pH 8.5 to pH 9.5, respectively. Thus, the cleaning solution remains stable for a prolonged period of time, and exhibits high sterilizing and wash-out activity during use.
申请公布号 US2016205937(A1) 申请公布日期 2016.07.21
申请号 US201314915211 申请日期 2013.08.30
申请人 EPIOS CO., LTD. 发明人 Shichitani Yasuo
分类号 A01N59/00;C25B1/26;A61K8/20;A61Q11/00;C11D7/08;C11D7/10 主分类号 A01N59/00
代理机构 代理人
主权项 1. A cleaning solution that is an aqueous solution containing hypochlorous acid and hypochlorite ions, wherein an effective residual chlorine concentration of the aqueous solution is adjusted to a value from 500 ppm to 2000 ppm, and a hydrogen ion concentration exponent of the aqueous solution is adjusted to a value from pH 8.5 to pH 9.5.
地址 Tokyo CN