发明名称 |
CLEANING SOLUTION AND MANUFACTURING METHOD THEREFOR |
摘要 |
The present invention has an object to provide a highly stable cleaning solution that generates a high concentration of hypochlorous acid during cleaning, and has sterilizing and washing out activity on bacteria and viruses. As means for achieving this object, a cleaning solution has been developed which is an aqueous solution containing hypochlorous acid and hypochlorite ions produced using a diaphragm-free electrolysis process. The effective residual chlorine concentration thereof and the hydrogen ion concentration exponent thereof are adjusted to a value from 500 ppm to 2000 ppm and to a value from pH 8.5 to pH 9.5, respectively. Thus, the cleaning solution remains stable for a prolonged period of time, and exhibits high sterilizing and wash-out activity during use. |
申请公布号 |
US2016205937(A1) |
申请公布日期 |
2016.07.21 |
申请号 |
US201314915211 |
申请日期 |
2013.08.30 |
申请人 |
EPIOS CO., LTD. |
发明人 |
Shichitani Yasuo |
分类号 |
A01N59/00;C25B1/26;A61K8/20;A61Q11/00;C11D7/08;C11D7/10 |
主分类号 |
A01N59/00 |
代理机构 |
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代理人 |
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主权项 |
1. A cleaning solution that is an aqueous solution containing hypochlorous acid and hypochlorite ions,
wherein an effective residual chlorine concentration of the aqueous solution is adjusted to a value from 500 ppm to 2000 ppm, and a hydrogen ion concentration exponent of the aqueous solution is adjusted to a value from pH 8.5 to pH 9.5. |
地址 |
Tokyo CN |