| 摘要 |
The present invention relates to a rectangular gate vacuum valve, an operation method therefor, and a semiconductor manufacturing device comprising the same. The rectangular gate vacuum valve of the present invention comprises: a gate frame having a first gate and a second gate formed on both side surfaces thereof facing each other; a first valve unit arranged so as to enable linear movement or rotation within the gate frame through a lower opening of the gate frame, and selectively opening and closing the first gate; and a second valve unit arranged so as to enable linear movement or rotation within the gate frame through an upper opening of the gate frame, and selectively opening and closing the second gate. |
