发明名称 ELECTRON BEAM MICROSCOPE WITH IMPROVED IMAGING GAS AND METHOD OF USE
摘要 Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH 3 CH 2 OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH 3 CH 2 OH to ionize the CH 3 CH 2 OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH 3 CH 2 OH-based processes.
申请公布号 EP3096343(A1) 申请公布日期 2016.11.23
申请号 EP20160169828 申请日期 2016.05.17
申请人 FEI COMPANY 发明人 SHANLEY, TOBY;SCOTT, JOHN;TOTH, MILOS
分类号 H01J37/244 主分类号 H01J37/244
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