发明名称 |
Exposure method and apparatus |
摘要 |
An exposure apparatus for exposing a photomask pattern onto a photosensitive substrate via a plurality of optical systems includes a source of illumination for irradiating the photomask pattern with beams of light adapted to pass through the pattern and optical systems onto the substrate. A scanning mechanism for synchronously scanning the photomask pattern with the beams of light is included to transfer the pattern to the substrate. A plurality of illumination intensity measuring devices is provided for substantially simultaneously measuring the illumination intensities of the beams of light passing through the optical systems.
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申请公布号 |
US5985496(A) |
申请公布日期 |
1999.11.16 |
申请号 |
US19970837277 |
申请日期 |
1997.04.11 |
申请人 |
NIKON CORPORATIOIN |
发明人 |
NARA, KEI;MATSUURA, TOSHIO |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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