发明名称 Semiconductor device and method for producing same
摘要 A void-collection section is provided on a GaAs FET chip at a location that avoids a heat-generating region of the chip. Pressure is applied to the rear surface of the substrate corresponding to the heat-generating region of the chip, this causing the removal of a void from immediately under the heat-generating section, and the capture of the void by the void-collection section, thereby suppressing the localized rise in temperature of the chip caused by the existence of the void.
申请公布号 US6166445(A) 申请公布日期 2000.12.26
申请号 US19980019745 申请日期 1998.02.06
申请人 NEC CORPORATION 发明人 KUSHIMA, MASAHITO
分类号 H01L21/52;H01L21/58;H01L21/60;H01L23/36;H01L29/06;(IPC1-7):H01L23/48;H01L23/52 主分类号 H01L21/52
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