发明名称 Method for manufacturing substrate for making microarray
摘要 A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided. A method for manufacturing a substrate for making a microarray, comprising, a step of forming a resist film on the substrate using a chemically amplified positive resist composition using a copolymer where a content of a monomer unit having a hydroxyl group is 5 mole % or less relative to total monomer units as a binder; a step of patterning the resist film; a step of forming a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film; and subsequently a step of removing the resist film.
申请公布号 US2008233521(A1) 申请公布日期 2008.09.25
申请号 US20080071889 申请日期 2008.02.27
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 KUSAKI WATARU;KINSHO TAKESHI;ISHIHARA TOSHINOBU
分类号 G03F7/38 主分类号 G03F7/38
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