发明名称 |
Method for manufacturing substrate for making microarray |
摘要 |
A method for manufacturing a substrate for making a microarray wherein a monomolecular film for immobilizing a target molecule can be simply formed position-selectively in manufacture of the substrate for making the microarray is provided. A method for manufacturing a substrate for making a microarray, comprising, a step of forming a resist film on the substrate using a chemically amplified positive resist composition using a copolymer where a content of a monomer unit having a hydroxyl group is 5 mole % or less relative to total monomer units as a binder; a step of patterning the resist film; a step of forming a monomolecular film having a silicon oxide chain on the substrate having the patterned resist film; and subsequently a step of removing the resist film.
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申请公布号 |
US2008233521(A1) |
申请公布日期 |
2008.09.25 |
申请号 |
US20080071889 |
申请日期 |
2008.02.27 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KUSAKI WATARU;KINSHO TAKESHI;ISHIHARA TOSHINOBU |
分类号 |
G03F7/38 |
主分类号 |
G03F7/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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