发明名称 MANUFACTURING METHOD OF LIQUID JET HEAD AND MANUFACTURING METHOD OF PIEZOELECTRIC ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a liquid jet head which includes improved reliability by preventing the occurrence of crack in a piezoelectric layer and to provide a manufacturing method of a piezoelectric element. <P>SOLUTION: The manufacturing method of the liquid jet head includes: a process for forming a lower electrode film 60 comprising an adhesion layer 62, a platinum layer 63 and a diffusion-preventing layer 64 on one surface side of a wafer 110 for a flow path forming substrate; a process for forming a dummy layer 74 in such a manner that a piezoelectric material is applied onto the lower electrode film 60 and sintered; a process for exposing the lower electrode film 60 by removing the dummy layer 74; a process for forming the piezoelectric layer 70 comprising a piezoelectric film 72 by executing a piezoelectric film forming process for forming a piezoelectric precursor film 71 in such a manner that sol of an organic metallic compound is applied onto the exposed lower electrode film 60 and forming the piezoelectric film 72 in such a manner that the piezoelectric precursor film 71 is heated, sintered and crystallized; and a process for forming an upper electrode film 80 on the piezoelectric layer 70. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009190351(A) 申请公布日期 2009.08.27
申请号 JP20080035656 申请日期 2008.02.18
申请人 SEIKO EPSON CORP 发明人 SAITO TAKESHI
分类号 B41J2/16;B41J2/045;B41J2/055;B41J2/135;B41J2/14;B41J2/145;H01L41/09;H01L41/187;H01L41/22;H01L41/318;H01L41/43 主分类号 B41J2/16
代理机构 代理人
主权项
地址