发明名称 Vacuum continuous line to process substrates
摘要 A continuously operated vacuum wafer-coating assembly has air locks to a process chamber via an inlet and an outlet. The chamber has a conveyer for (11) a plasma boat holding the stacked wafers. The wafers are stacked equally spaced in the same plane on an electrically conducting rack (32) with a base plate (30) and subject to alternating current. The wafers are stacked either horizontally in the plasma boat in one or more levels. The wafers are 1 m x 0.2 m and are separated by a gap of 3-20 mm. One or more plasma boats pass through the chamber at the same time and linked together in series. The plasma boat has runners or rollers and may a transverse and/or longitudinal passage through the chamber.
申请公布号 EP2053649(B1) 申请公布日期 2016.06.08
申请号 EP20080167026 申请日期 2008.10.20
申请人 CENTROTHERM PHOTOVOLTAICS AG 发明人 DAHL, ROLAND;HAASE, JOSEF;HEINTZE, DR. MORITZ;PERNAU, DR. THOMAS;REICHART, HANS;WANKA, DR. HARALD;KÄHLER, DR. JAN-DIRK;LENZ, REINHARD;ZERNICKEL, DIETER;HARTUNG, ROBERT MICHAEL
分类号 H01L21/677;C23C16/458 主分类号 H01L21/677
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