ANTI-REFLECTION COATING

摘要

This invention relates to a UV-curable coating material comprising an organosilica compound such as POSS or octahedral oligomeric silsesquioxane which is functionalized with a UV-curable functional group. The material further comprises at least one UV-curable cross-linker. The coating material comprises surface structures in the nano-sized range and can be used in a nanoimprint coating process where the material is coated on a substrate such as glass and a mold is pressed against the material to form an imprint before curing by UV radiation.