发明名称 Chemical modification process for a deep polymeric matrix
摘要 The present invention relates to a process for chemically modifying, within its thickness, a polymer matrix chosen from matrices made of fluoropolymers and matrices made of aliphatic polymers, said process comprising at least one step consisting in irradiating said matrix with UV light having a wavelength of less than 300 nm in order to generate, within the thickness of said matrix, zones that have short polymer chains, formed by scission of the existing chains during the passage of the UV radiation and that have free radicals denoted hereinbelow as “activated zones”. The present invention also relates to the polymer matrix capable of being chemically modified by such a process.
申请公布号 US9453284(B2) 申请公布日期 2016.09.27
申请号 US201012772122 申请日期 2010.04.30
申请人 Commissariat a L'Energie Atomique et aux Energies Alternatives 发明人 Berthelot Thomas;Baudin Cécile
分类号 B05D3/06;C23C18/16;C08J3/28;C08J7/12;C08J7/16;C23C18/18;C23C18/20 主分类号 B05D3/06
代理机构 Nixon Peabody LLP 代理人 Nixon Peabody LLP ;Shami Khaled
主权项 1. Process for chemically modifying a polymer matrix chosen from matrices made of fluoropolymers and matrices made of aliphatic polymers, at a distance greater than 250 nm with respect to the surface of said matrix, characterized in that said process comprises at least one step (a) consisting in irradiating said matrix with ultraviolet light having a wavelength of less than 300 nm in order to generate, at a distance greater than 250 nm with respect to the surface of said matrix, zones that have short polymer chains, formed by scission of the existing chains during the passage of the ultraviolet radiation and that have free radicals denoted hereinbelow as “activated zones,” wherein said irradiating step lasts from 1 min to 5 h, and wherein said matrix has a thickness between 1 μm and 1 cm, wherein said irradiating step is performed under an inert gas, wherein said process further comprises the step of bringing said irradiated matrix obtained in said step (a) and which only presents alkyl radicals into contact with a solution containing at least one compound bearing at least one ethylenically unsaturated group, wherein said solution is subjected to a sparging under nitrogen prior to said contact and from said contacting onwards, and wherein said polymer matrix is a matrix made of a fluoropolymer chosen from the group consisting of homopolymers and copolymers of vinylidenefluoride; homopolymers and copolymers of trifluoroethylene; copolymers of fluoroethylene and of propylene; copolymers of tetrafluoroethylene and of tetrafluoropropylene; copolymers of ethylene and of at least one fluoromonomer; and mixtures thereof.
地址 Paris FR