发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION OF THE SAME
摘要 The present invention relates to a photosensitive resin composition for a color filter and an application of the same. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D) and a pigment (E). The alkali-soluble resin (A) includes a first alkali-soluble resin (A-1) having the structure represented by formula (1). The aforementioned photosensitive resin composition is advantageously applied for the color filer with better contrast.;
申请公布号 US2016327863(A1) 申请公布日期 2016.11.10
申请号 US201615147913 申请日期 2016.05.06
申请人 Chi Mei Corporation 发明人 Hsu Jung-Pin;Lin Bo-Hsuan
分类号 G03F7/039;G02F1/1335;G02B5/22;G03F7/00 主分类号 G03F7/039
代理机构 代理人
主权项 1. A photosensitive resin composition, comprising: an alkali soluble resin (A); a compound (B) containing an ethylenically unsaturated group; a photoinitiator (C); an organic solvent (D); and a pigment (E); wherein, the alkali soluble resin (A) comprises a first alkali soluble resin (A-1) having the structure represented by formula (1); in formula (1), R1, R2, R3 and R4 each independently represents a hydrogen, a C1 to C8 alkyl group, a C3 to C8 cycloalkyl group or phenyl group, wherein the alkyl group, the cycloalkyl group and the phenyl group may be substituted; R5 and R6 each independently represents a hydrogen, a C1 to C8 alkyl group or chlorine; R7 represents a divalent organic group; * represents a bonding position.
地址 Tainan City TW