发明名称 Flare-measuring mask, flare-measuring method, and exposure method
摘要 A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter portion and an outer diameter portion which connect both ends of the first side and both ends of the second side; projecting an image of the sectoral pattern via the projection optical system; and determining the flare information based on a light amount of the image of the sectoral pattern and a light amount provided at a position away from the image. With the flare measuring method, it possible to correctly measure the flare information in an arbitrary angle range.
申请公布号 US9529251(B2) 申请公布日期 2016.12.27
申请号 US201414576817 申请日期 2014.12.19
申请人 NIKON CORPORATION 发明人 Shiraishi Masayuki
分类号 G03F1/44;G03F1/22;G03F1/00;G03F7/20;G01N21/47 主分类号 G03F1/44
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A flare-measuring mask comprising: at least one pattern having a region formed between a first straight line edge, a second straight line edge which is inclined at a predetermined angle with respect to the first straight line edge and a first connecting edge which connects one end of the first straight line edge and one end of the second straight line edge, a first line that includes the first straight line edge intersecting a second line that includes the second straight line edge, the region formed by and between the first and second straight line edges and the first connecting edge.
地址 Tokyo JP