X-ray illumination optical system and X-ray reduction exposure apparatus

摘要

An X-ray illumination optical system for an X-ray reduction projection exposure apparatus includes an oblique projection reflection integrator having a reflection surface provided by a plurality of small cylindrical surfaces arrayed in parallel, to perform Koehler illumination of a region of arcuate shape. It enables X-ray illumination of only ah arcuate region and reduces loss of light quantity and exposure time.