发明名称 Inductor system and method
摘要 A system and method for providing and manufacturing an inductor is provided. In an embodiment similar masks are reutilized to form differently sized inductors. For example, a two turn inductor and a three turn inductor may share masks for interconnects and coils, while only masks necessary for connections between the interconnects and coils may need to be newly developed.
申请公布号 US9406739(B2) 申请公布日期 2016.08.02
申请号 US201414182116 申请日期 2014.02.17
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Tsai Hao-Yi;Chen Hsien-Wei;Kuo Hung-Yi;Yu Tsung-Yuan
分类号 H01L21/8234;H01L21/8244;H01L49/02;H01L23/522;H01L27/06;H01L27/08 主分类号 H01L21/8234
代理机构 Slater Matsil, LLP 代理人 Slater Matsil, LLP
主权项 1. A method of manufacturing semiconductor devices, the method comprising; manufacturing a first inductor using a first mask and a second mask, wherein the first inductor is manufactured in a first semiconductor device; and manufacturing a second inductor using the first mask and a third mask but not the second mask, wherein the second inductor is manufactured in a second semiconductor device different from the first semiconductor device.
地址 Hsin-Chu TW