发明名称 |
Inductor system and method |
摘要 |
A system and method for providing and manufacturing an inductor is provided. In an embodiment similar masks are reutilized to form differently sized inductors. For example, a two turn inductor and a three turn inductor may share masks for interconnects and coils, while only masks necessary for connections between the interconnects and coils may need to be newly developed. |
申请公布号 |
US9406739(B2) |
申请公布日期 |
2016.08.02 |
申请号 |
US201414182116 |
申请日期 |
2014.02.17 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Tsai Hao-Yi;Chen Hsien-Wei;Kuo Hung-Yi;Yu Tsung-Yuan |
分类号 |
H01L21/8234;H01L21/8244;H01L49/02;H01L23/522;H01L27/06;H01L27/08 |
主分类号 |
H01L21/8234 |
代理机构 |
Slater Matsil, LLP |
代理人 |
Slater Matsil, LLP |
主权项 |
1. A method of manufacturing semiconductor devices, the method comprising;
manufacturing a first inductor using a first mask and a second mask, wherein the first inductor is manufactured in a first semiconductor device; and manufacturing a second inductor using the first mask and a third mask but not the second mask, wherein the second inductor is manufactured in a second semiconductor device different from the first semiconductor device. |
地址 |
Hsin-Chu TW |