FILM-FORMING MASK, FILM-FORMING DEVICE, AND FILM-FORMING METHOD

摘要

A mask (11) comprising a mask substrate (12) having a protruding section (19) in an opening end surface (16) of an opening (14), having an acute angle defined by θ1 and θ2 of no more than 43°, and having a height from a film-formation surface (200a) on the substrate (200) to a tip section (19a) of the protruding section (19) of at least the thickness of the film to be formed on the film-formation surface (200a).