| 发明名称 |
TIN OXIDE SPUTTERING TARGET AND METHOD FOR MAKING THE SAME |
| 摘要 |
A tin oxide sputtering target includes uniformly mixed elemental Sn and SnO2. An atomic ratio of Sn atoms and O atoms in the tin oxide sputtering target satisfies 1:2<Sn:O≦2:1. A method for making a tin oxide sputtering target includes steps of: providing Sn powder and SnO2 powder; mixing the Sn powder and the SnO2 powder to form a mixture, an atomic ratio of Sn atoms and O atoms in the mixture satisfies 1:2<Sn:O≦2:1; and press-molding and sintering the mixture to obtain a tin oxide sputtering target, the sintering is performed in an inert atmosphere. |
| 申请公布号 |
US2016326634(A1) |
申请公布日期 |
2016.11.10 |
| 申请号 |
US201514842217 |
申请日期 |
2015.09.01 |
| 申请人 |
Tsinghua University ;HON HAI PRECISION INDUSTRY CO., LTD. |
发明人 |
ZHUANG DA-MING;ZHAO MING;GUO LI;CAO MING-JIE;LI XIAO-LONG;SUN RU-JUN |
| 分类号 |
C23C14/34;C04B35/457 |
主分类号 |
C23C14/34 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A tin oxide sputtering target comprising:
uniformly mixed elemental Sn and SnO2; wherein an atomic ratio of Sn atoms and O atoms in the tin oxide sputtering target satisfies 1:2<Sn:O≦2:1. |
| 地址 |
Beijing CN |
