发明名称 Copper-Titanium Alloy for Electronic Component
摘要 The present invention controls the fluctuations of Ti concentration in a copper titanium alloy from a perspective different from conventional perspectives to improve the strength and bending workability of the copper titanium alloy. A copper titanium alloy for electronic components comprising 2.0 to 4.0 mass % of Ti, and 0 to 0.5 mass %, in total, of one or more elements selected from the group consisting of Fe, Co, Mg, Si, Ni, Cr, Zr, Mo, V, Nb, Mn, B, and P as a third element, with the balance being copper and unavoidable impurities, wherein a coefficient of variation in a Ti concentration fluctuation curve is 0.2 to 0.8, the Ti concentration fluctuation curve being obtained when Ti in a matrix phase for <100>-oriented crystal grains in a cross section parallel to a rolling direction is subjected to line analysis by EDX, and in structure observation of a cross section parallel to the rolling direction, a number of second-phase particles having a size of 3 μm or more per an observation field of view of 10000 μm2 is 35 or less.
申请公布号 US2016326611(A1) 申请公布日期 2016.11.10
申请号 US201415108338 申请日期 2014.09.11
申请人 JX Nippon Mining & Metals Corporation 发明人 Horie Hiroyasu
分类号 C22C9/00;H01B1/02;C22F1/08 主分类号 C22C9/00
代理机构 代理人
主权项 1. A copper titanium alloy for electronic components comprising 2.0 mass % to 4.0 mass % of Ti, and 0 mass % to 0.5 mass %, in total, of one or more elements selected from the group consisting of Fe, Co, Mg, Si, Ni, Cr, Zr, Mo, V, Nb, Mn, B, and P as a third element, with the balance being copper and unavoidable impurities, wherein a coefficient of variation in a Ti concentration fluctuation curve is 0.2 to 0.8, the Ti concentration fluctuation curve being obtained when Ti in a matrix phase for <100>-oriented crystal grains in a cross section parallel to a rolling direction is subjected to line analysis by EDX, and in structure observation of a cross section parallel to the rolling direction, a number of second-phase particles having a size of 3 μm or more per an observation field of view of 10000 μm2 is 35 or less.
地址 Tokyo JP