发明名称 MANUFACTURING METHOD OF POLISHING PAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method to manufacture a polishing pad superior in flattening characteristics, capable of restraining growth of scratches, high in polishing speed and furnished with a positive ray easily and favorably in productivity. <P>SOLUTION: This manufacturing method of the polishing pad includes a process to manufacture a laminated sheet by laminating a resin layer on one side of a tin sheet having at least one protruded part for connection of the positive ray, a process to form a large number of through-holes A passing through the tin sheet and the resin sheet on a part except for the protruded part for connection of the positive ray of the laminated sheet and a process to connect the positive ray to the protruded part for connection of the positive ray of the tin sheet. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009241207(A) 申请公布日期 2009.10.22
申请号 JP20080091036 申请日期 2008.03.31
申请人 TOYO TIRE & RUBBER CO LTD 发明人 MARUYAMA SATOSHI;OGA TAKASHI;OKUMURA HIROYUKI;SHIMIZU SHINJI;NAKAJIMA SACHIKO
分类号 B24B37/22;B24B37/24;B24B37/26;H01L21/304 主分类号 B24B37/22
代理机构 代理人
主权项
地址