| 摘要 |
An apparatus and process for applying finish to an expanded filament array i n a quench system with air directed inward to the filament bundle. The applicator may be used inside or proximate quench zones in a radial, pneumatic, or cross-flow quench system. The apparatus includes a spinneret (20), a quench zone (80) located below said spinneret (20), wherein cooling gas is directed inward to an expanded filament array (50) inside said quench zone (80), and an applicator (60) inside or below said quench zone (80), wherein the applicator (60) contacts the filament and delivers the finish to the expanded filament array (50). |
