发明名称 Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction
摘要 A device for processing gases includes a cylindrical housing in which an electrically grounded, metal injection/extraction gas supply tube is disposed. A dielectric tube surrounds the injection/extraction gas supply tube to establish a gas modification passage therearound. Additionally, a metal high voltage electrode circumscribes the dielectric tube. The high voltage electrode is energizable to create nonthermal electrical microdischarges between the high voltage electrode and the injection/extraction gas supply tube across the dielectric tube within the gas modification passage. An injection/extraction gas and a process gas flow through the nonthermal electrical microdischarges within the gas modification passage and a modified process gas results. Using the device contaminants that are entrained in the process gas can be destroyed to yield a cleaner, modified process gas. Also, a modified process gas or gas/vapor mixture can be generated and can be combusted more efficiently and with the emission of less pollution.
申请公布号 US2004182314(A1) 申请公布日期 2004.09.23
申请号 US20030395046 申请日期 2003.03.21
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 ROSOCHA LOUIS A.
分类号 B01D53/32;B01J19/08;H01J37/32;(IPC1-7):C23C16/00 主分类号 B01D53/32
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