发明名称 Automated Sputtering Target Production
摘要 A system and method are provided for manufacturing workpieces, such as metal articles like sputtering target, the system comprising: comparing one or more physical or chemical values of a respective one of a plurality of metal target blanks to one or more comparable values of at least one desired criterion; selecting one of the metal target blanks from a plurality of metal target blanks as a work-in-progress; assigning a serial route for the work-in-progress; processing the work-in-progress by translating the work-in-progress from note to node with an automated transport, after completion of the events at each node; rejecting or accepting the work-in-progress as a metal target by evaluating a result of at least one event of the one or more respective events to be completed at, at least one of the plurality of nodes.
申请公布号 US2008221721(A1) 申请公布日期 2008.09.11
申请号 US20060795395 申请日期 2006.01.18
申请人 TOSOH SMD ETNA, LLC 发明人 REED WILEY ZANE;COSPER BOBBY R.;SCHMIDT KENNETH G.;BULTZ NEIL D.;WICKERSHAM CHARLES E.;MATERA JOHN P.
分类号 G06F17/00 主分类号 G06F17/00
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