PATTERN DATA PROCESSING METHOD AND SYSTEM, AND EXPOSURE METHOD AND APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a pattern data processing method in which production efficiency of a mask pattern is improved, and parameters of a real exposure machine can be taken into consideration as required.

SOLUTION: A pattern data processing system is equipped with: a parameter input unit 62 acquiring parameters relating to an optical image and a resist image of a real exposure machine; simulation units 64, 65 obtaining an optical image and a resist image of a test pattern by simulation using the parameters; a data input unit 66 acquiring data of a resist image formed from the test pattern by using the real exposure machine; and a circuit design system 70 designing a reticle pattern by using values of parameters when a shape error between two resist images is within a predetermined allowable range.

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