| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a post exposure device into which a liquid plate photosensitive resin letterpress can be smoothly conveyed. <P>SOLUTION: The post exposure device performs a post exposure process of a liquid plate photosensitive resin letterpress which is conveyed in a suspended state from above into a liquid tank along a slope guide, rendered into an appropriately horizontal state while slid on the bottom of the liquid tank and sunk in the liquid in the liquid tank, wherein a plurality of projections are formed on the upper face of the slope guide, the projections being approximately parallel to the conveying direction of the liquid plate photosensitive resin letterpress. <P>COPYRIGHT: (C)2009,JPO&INPIT |
