RESIN COMPOSITION FOR FORMING UNDERLAYER FILM, KIT FOR FORMING IMPRINT, LAMINATE, PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING DEVICE

摘要

Provided are: a resin composition for forming an underlayer film, which is capable of forming an underlayer film having good surface properties and good adhesion to a base; a kit for forming an imprint; a laminate; a pattern forming method; and a method for manufacturing a device. A resin composition for forming an underlayer film, which contains a resin, a nucleophilic catalyst and a solvent, and wherein the content of the nucleophilic catalyst is 0.01-3% by mass relative to the solid content of the resin composition for forming an underlayer film.