| 发明名称 |
ANNULAR BAFFLE |
| 摘要 |
A baffle assembly for an etching apparatus is disclosed. The baffle assembly comprises a ring and a lower baffle portion having a curved wall extending between a flange portion and a lower frame portion. A heating assembly may be present within the lower frame portion to control the temperature of the baffle. The baffle assembly may help confine the plasma within the processing space in the chamber. The ring may comprise silicon carbide and the lower baffle portion may comprise aluminum. |
| 申请公布号 |
US2016341227(A1) |
申请公布日期 |
2016.11.24 |
| 申请号 |
US201615228660 |
申请日期 |
2016.08.04 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
HOFFMAN Daniel J.;BERA Kallol |
| 分类号 |
F15D1/00;H01L21/683;C23C14/22;H01L21/67;H01J37/32;C23C16/44 |
主分类号 |
F15D1/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A baffle assembly, comprising:
a ring; a base portion coupled to the ring, the base portion having an opening formed axially therethrough, the base portion comprising:
a flange having a first diameter;a ledge formed on a surface of the opening;a lower frame portion having a second diameter less than the first diameter; anda supporting portion for supporting the flange; and a heating assembly. |
| 地址 |
Santa Clara CA US |
