发明名称 FLOATING GATE MEMORY CELLS IN VERTICAL MEMORY
摘要 Floating gate memory cells in vertical memory. A control gate is formed between a first tier of dielectric material and a second tier of dielectric material. A floating gate is formed between the first tier of dielectric material and the second tier of dielectric material, wherein the floating gate includes a protrusion extending towards the control gate. A charge blocking structure is formed between the floating gate and the control gate, wherein at least a portion of the charge blocking structure wraps around the protrusion.
申请公布号 EP2973710(A4) 申请公布日期 2016.12.28
申请号 EP20140770149 申请日期 2014.03.05
申请人 Micron Technology, Inc. 发明人 DENNISON, Charles H.;GODA, Akira;HOPKINS, John;SIMSEK-EGE, Fatma Arzum;PARAT, Krishna K.
分类号 H01L27/115;H01L21/28;H01L29/66 主分类号 H01L27/115
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