发明名称 Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus
摘要 A marker structure on a substrate for optical alignment of the substrate includes a plurality of first structural elements and a plurality of second structural elements. In use, the marker structure allows the optical alignment based upon providing at least one light beam directed on the marker structure, detecting light received from the marker structure at a sensor, and determining alignment information from the detected light, the alignment information comprising information relating a position of the substrate to the sensor.
申请公布号 US7619738(B2) 申请公布日期 2009.11.17
申请号 US20070003377 申请日期 2007.12.21
申请人 ASML NETHERLANDS B.V. 发明人 VAN HAREN RICHARD JOHANNES FRANCISCUS;HINNEN PAUL CHRISTIAAN;LALBAHADOERSING SANJAY;MEGENS HENRY;VAN DER SCHAAR MAURITS
分类号 G01B11/00;G01J4/00;G01B11/02;G01B21/00;G02B5/18;G03F7/00;G03F7/20;G03F9/00;G03F9/02;H01L21/027;H01L21/3205;H01L21/68;H01L23/52;H01S3/00 主分类号 G01B11/00
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